Abstract
N-(Trimethylsilyl)maleimide (TMSMI) has been polymerized with various styrenic monomers (XSt) in the presence of a radical initiator to give high-molecular-weight, alternating copolymers in high yields. The copolymers P(TMSMI/XSt) have high glass transition temperatures above 200°C and thermal decomposition temperatures in the range 320–360°C. The thermal and acidolytic deprotection of trimethylsilyl (TMS) groups of TMSMI units in the copolymers have been investigated. UV irradiation and subsequent heating of a film of P(TMSMI/t-BOCSt) containing a photoacid generator resulted in deprotection of the protecting groups by the photogenerated acids, thereby causing a significant change in solubility of the polymer. Thus positive image patterns were obtained with P(TMSMI/t-BOCSt) by photolithographic processes. © 1998 Society of Chemical Industry
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