Abstract
Crystalline TiO2 thin films were synthesized on the Si and glass substrates by reactive sputtering in a HIPIMS+ coating system. The films with a bit oxygen deficiency were deposited on the Si and glass substrates at oxygen flux rate of 10sccm. The phase structure of the films changed with varying the parameters the MPP power pulse, the bias voltage, and working gas pressure. Anatase-dominant, anatase–rutile, and rutile films can be obtained by controlling the deposition parameters. The anatase-dominant and anatase–rutile TiO2 films possess good photoinduced hydrophilicity and photocatalytic properties. The rutile films exhibited high dielectric constant. The related mechanism and potential application was discussed.
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