Abstract

Recently, N-hydroxysulfonamides (RSO2NHOH) caged by photolabile protecting groups have attracted significant interest as potential photoactive nitroxyl (HNO) donors. The selectivity of the desired HNO generation pathway from photocaged N-hydroxysulfonamides versus a competing pathway involving O-N bond cleavage is dependent on the specific photodeprotection mechanism of the phototrigger. We present a new class of photocaged N-hydroxysulfonamides incorporating the well-established o-nitrobenzyl photoprotecting group, including a derivative incorporating an additional carbonate linker. Photodecomposition of o-NO2Bn-ON(H)SO2CF3 and the corresponding 2-nitro-4,5-dimethoxybenzyl analog generated the desired HNO and CF3SO2- as a minor pathway, with competing photoinduced O-N bond cleavage to release CF3SO2NH2 as the major photodecomposition pathway. Photolysis of the corresponding -SO2CH3 analogs resulted in O-N bond cleavage only. The presence of the o-nitro substituent was shown to be essential for photoactivity. Photorelease of the parent HNO donor CH3SO2NHOH was observed as the major product upon irradiation of o-NO2Bn-OC(O)ON(H)SO2CH3, with the desired HNO release and O-N bond cleavage occurring as minor pathways. Photoproduct quantum yields for each species have been determined by actinometry. The effect of solvent, pH and air on the mechanism of photodecomposition was studied for o-NO2Bn-ON(H)SO2CH3. The ratio of the solvents in the solvent mixture (CH3CN and phosphate buffer, pH 7.0), the pH of the aqueous component of the buffer, and the presence of oxygen did not affect the amount of each photoproduct and the observed rate constant for O-N bond cleavage. Possible mechanisms for the various pathways are proposed.

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