Synthesis and measurement of OsSi multilayer mirrors optimized for the wavelength 380 Å

I.V Kozhevnikov,L.L Balakireva,A.I Fedorenko,I.A Kopealets,V.E Levashov,A.N Stetsenko,I.I Struk,A.V Vinogradov

doi:10.1016/0030-4018(95)00713-x

Synthesis and measurement of OsSi multilayer mirrors optimized for the wavelength 380 Å

I.V Kozhevnikov, L.L Balakireva + Show 6 more

https://doi.org/10.1016/0030-4018(95)00713-x

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Journal: Optics Communications	Publication Date: Apr 1, 1996
Citations: 8

Affiliation: National Technical University "Kharkiv Polytechnic Institute", P.N. Lebedev Physical Institute of the Russian Academy of Sciences

#Ultra Soft X-ray Region #Multilayer Reflectivity + Show 8 more

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Abstract

Flat and spherical OsSi multilayer mirrors were synthesized and studied. Measured normal incidence reflectivity was 20% at the wavelength λ = 380 A ̊ . The effect of impurities in silicon layers on the multilayer reflectivity in ultra soft X-ray region is discussed.

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