Abstract
The synthesis and investigation of properties of N-[[bis(trimethylsilyl)amino](fluoro)boryl]-(trimethyl)-N-(trimethylsilyl)silanamine as a possible precursor for the preparation of SiBxCyNz films were carried out. The identity of the compound has been confirmed by elemental analysis, IR, and 1H NMR spectroscopy methods of investigation, and its sensitivity to UV radiation has been determined by UV spectroscopy. The temperature intervals of thermoanalytical and thermogravimetric effects have been shown by the complex thermal analysis method. The volatility and thermal stability of the compound in the temperature range of 77–178°C have been quantitatively determined from the temperature dependences of the saturated vapor pressure using tensimetric studies. It has been established that despite the partial decomposition in the temperature range under investigation, the compound FB[N(SiMe3)2]2 can be used as a precursor in the processes of chemical vapor deposition of a substance.
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