Abstract
We have developed novel alicyclic polymers having monoacid ester structures by alcoholysis of non-conjugated cyclic diene and malefic anhydride copolymers. This polymer, named ALPHA, exhibited good solubility (10-50nm/sec) in 0.113% aqueous tetramethyl-ammonium hydroxide solution without swelling. Absorbance was around 0.6 μm-1 at 193nm. Dry-etching resistance for Cl2/BCl3 gas was the same as that of polyhydroxystyrene. A two-component resist system, consisting of 1-ethoxyethyl-protected ALPHA polymer and onium salt, produced 0.20-μm line-and-space patterns using a KrF excimer laser stepper with a phase-shifting mask. Consequently, we believe ALPHA is suitable as a base polymer for ArF excimer laser resists.
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