Abstract

In the present study, the synthesis and characterization of ZnO thin films deposited at 300, 350 and 400°C using the Ultrasonic Spray Pyrolysis technique, as a possible candidate for electron transport layer (ETL) in solar cells is reported. X-ray diffraction (XRD) analysis revealed that the films have a hexagonal wurtzite phase with a preferential orientation (101) with good polycrystallinity. The mean crystallites size based on the Debye-Scherrer model was calculated, indicating that the size of the crystals decreases as the deposition temperature increases. The optical characterization of the material showed a high transmittance in the visible region (85-99%) with which the optical band gap (3.06-3.29 eV) was determined. The thickness, surface roughness and optical constants (n and k) were determined by Spectroscopic Ellipsometry using the Gaussian oscillator model. Hall Effect revealed a low resistivity of 1-4 Ω cm and a high mobility of charge carriers (304 cm2/Vs) in the films. Due to all these properties, ZnO is considered an ideal material for optoelectronic applications, as well as a material with potential to be used as ETL in solar cells.

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