Abstract
Thin film coatings of titanium carbide (TiC) and titanium- carbo-nitride (TiCN) were deposited on Si(100) substrates using the pulsed laser deposition (PLD) method. The PLD method is a unique process for depositing high-quality thin films with novel microstructure and properties. Mechanical properties of TiCN are found to be dependent on the nitrogen ambient during deposition. For nitrogen ambient pressure of 20 mTorr the TiCN has hardness values close to TiN hardness values, whereas for nitrogen ambient pressure of 5 mTorr the hardness values of the TiCN films are comparable to the hardness values of the TiC films.
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