Abstract
Using ionic source assistant, Ti and N co‐doped amorphous C (α‐C:N:Ti) thin films were prepared by pulse cathode arc technique. Microstructure, composition, elemental distribution, morphology, and mechanical properties of α‐C:N:Ti films were investigated in dependence of nitrogen source, pulse frequency, and target current by Raman spectroscopy, X‐ray diffraction, scanning electron microscopy, X‐ray photoelectron spectroscopy, atomic force microscopy, nanoindentation, and surface profilometer. The results show the presence of titanium carbide and nitride in a‐C:N:Ti films. The α‐C:N+:Ti film (6 Hz, 60 A) shows the smaller size and the higher disordering degree of Csp2 clusters. The α‐C:N+:Ti films present smoother surface and smaller particle size than for α‐C:N2:Ti films. N ions facilitate the formation of N‐sp3C bonds in the α‐C:N+:Ti films, and α‐C:N+:Ti (10 Hz, 80 A) film possesses the more graphite‐like N bonds. Higher hardness and lower residual stress present in the α‐C:N2:Ti (10 Hz, 80 A) film.
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