Abstract

Tetrakis (dimethylamino) tin(IV) (TDMASn) is a metal organic precursor used for fabricating transparent conducting tin oxide (SnO2) thin films via atomic layer deposition process (ALD). This study reported for the first time, a spin coating fabrication process of transparent conducting SnO2 thin films using TDMASn as the precursor for electrode materials of solar cells substrate. The samples were prepared using sol–gel spin-coating process and annealed at different temperatures to form metastable crystal structured SnO2 thin films. The manufactured thin films consequently underwent X-ray diffraction (XRD), scanning electron microscope (SEM), UV–vis spectroscopy, and resistivity analysis. The XRD analysis certified the films to be of polycrystalline structure, with the SEM results revealing variations in film thicknesses. The UV–vis analysis demonstrated a peak absorption band at 250 nm, while the highest transmittance of 83.2% in the visible range was noticed at the 550 °C sample.

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