Abstract
The fluorine-containing block copolymers of poly(styrene-block-2,2,2-trifluoroethyl methacrylate) (PS-b-PTFEMA) and poly(4-hydroxystyrene-block-2,2,2-trifluoroethyl methacrylate) (PHOST-b-PTFEMA), which all are capable of both top-down and bottom-up lithography were developed. The reported block copolymers were synthesized by either anionic polymerization or atom transfer radical polymerization (ATRP). Characterization of bulk and thin films were carried out using differential scanning calorimetry (DSC), transmission electron microscopy (TEM) and small angle X-ray scattering (SAXS). Thin films of the resulting block copolymers were subjected to conventional lithographic processing using e-beam and deep-UV radiation to create integrated patterns such as dots in lines.© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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