Abstract
Two different radiation-curable antistatic monomers (RCAMs), suitable for the production of antistatic coatings, were synthesized by reacting N, N-dimethylethanolamine and glycidyl methacrylate with trifluoroacetic acid (RCAM I) and acetic acid (RCAM II), respectively. In order to compare the curing behavior of RCAM I and RCAM II with conventional monomers, the photopolymerization of RCAM I, RCAM II, hydroxy propyl acrylate (HPA) and hydroxy ethyl methacrylate (HEMA) were investigated by differential photo calorimetry. Coating properties such as surface electrical resistance, hardness, chemical resistance, and surface tension of the UV-cured films containing RCAM I and RCAM II were investigated. The results show that UV-cured films containing the prepared RCAM I and RCAM II provide a surface resistance of 10 8 to 10 11 Ω/cm 2, depending upon the RCAM content. RCAM I produced superior solvent and stain resistant coating while sacrificing hardness, whereas RCAM II produced excellent antistatic properties and pencil hardness while sacrificing the solvent and stain resistances. The results of an FTIR-ATR depth-profile analysis show that the fluorine in the RCAM I was more concentrated near the surface of the samples.
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