Abstract
This paper investigates the characteristics of poly(pyrrole-co-aniline) copolymer (PYPAN) films deposited by using an atmospheric pressure plasma (APP) polymerization relative to various concentrations of aniline and pyrrole monomers. The surface morphology and structure properties of PYPAN films are observed to strongly depend on the pyrrole concentration (%), which is confirmed by Field emission-scanning electron microscopy (FE-SEM), Fourier transforms-infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy (XPS), and time of flight-secondary ion mass spectrometry (ToF-SIMS). In particular, it is observed that the PYPAN film grown at an optimal pyrrole concentration condition (that is, aniline 25% and pyrrole 75%) shows a lower electrical resistance and higher deposition rate.
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