Synthesis and characterization of plasma-polymerized hexamethyldisiloxane films

Abstract

The deposition rates of plasma-polymerized (pp-) films from hexamethyldisiloxane (HMDSO) monomer were determined by the quartz crystal microbalance technique. Using the several polymerization conditions for HMDSO, these were found that the deposition rates were proportional to the polymerization time. The deposition rate of the pp-HMDSO films increased with the increasing RF power. But for vapor pressure, the deposition rates increased with increasing the vapor pressure until 100 Pa; above it, deposition rates tended to decrease gradually. The maximum deposition rate of pp-HMDSO film was obtained 4.577 μg/min on 150 W of RF power at 100 Pa of monomer pressure.