Abstract
We present the synthesis and characterization of a family of photolabile co- and terpolymers (acrylate/methacrylate type) suitable for nanotechnology applications. They have been obtained by free radical polymerization of the corresponding monomers: a photosensitive component (nitroveratryl methacrylamide type), which allows the release of amino functionalities after the irradiation with UV light, a dithiol derivative that enables the covalent attachment of these materials onto gold substrates, and methyl methacrylate or styrene acting as a spacer between both functional units, promoting the formation of films with good quality. The polymers have been characterized using techniques as NMR, FTIR, GPC, TGA, DSC and UV spectroscopy. The deprotection of the amino function in the terpolymers by UV irradiation has been proven.
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