Abstract
Study on the growth of nanarod by means of pulsed plasma chemical vapor deposition was reported. Pure iron plate was used as a substrate acted as both the supporter and catalyst for growing nanorod. The effects of hydrogen plasma treatment and methane plasma treatment in the synthesis processes were studied. Nanoparticles were formed on substrate treated by negative hydrogen plasma while nanorods were grown on these nanoparticles after further treatment by methane plasma. The suitable times for hydrogen plasma and methane plasma treatment were both 10 min. Nanorod was about 60 nanometers in diameter and about 600 nanometers in length. The diffraction of nanorods was agreed with crystal structure of iron carbide.
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