Abstract
The HiPIMS technique in DOMS mode was used to deposit tantalum (Ta) and Ta1-xOx films. After depositing pure metallic Ta and Ta1-xOx films with two different thicknesses, their structure, morphology and chemical composition were investigated. Nano-indentation was used to evaluate the hardness of the films. OCP, potentiodynamic and EIS in artificial saliva at T = 37 °C were used to investigate the corrosion behaviour of the coatings. The results showed that, in the case of metallic coatings, increasing the film thickness, the β-phase becomes dominant over the α-phase, which compromised both the mechanical and electrochemical behaviours. Tantalum oxide films raised the polarisation resistance of the non-reactive coatings (metallic ones), exhibiting values 2–3 orders of magnitude higher.
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