Abstract
We investigate the structural and interfacial properties of thin Pr2O3 films on Si(001) substrates grown by molecular beam epitaxy using synchrotron grazing incidence x-ray diffraction and reflectivity measurements in ultrahigh vacuum. The epitaxial films consist of two orthogonal [101]-oriented cubic domains, with equal proportion. The average in-plane domain sizes are larger than the film thickness. Scans along crystal truncation rods confirm the cubic Mn2O3 structure of the epitaxial layer. A small amount of hexagonal Pr2O3 is found in thin films. Its fraction increases with increasing layer thickness indicating that it is not confined to the interface. Reflectivity measurements reveal an additional layer at the Pr2O3∕Si(001) interface, which is extended by in situ annealing. Transmission electron microscopy of the samples confirms the structural properties of the films found by the x-ray measurements and shows that the interfacial layers are nonuniform with a coexistence of crystalline and amorphous regions.
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