Abstract

Synchrotron radiation (SR) stimulated surface process has been actively studied as anew application field of the SR in the last decade. The reaction mechanism study with these surface photochemical process is necessary to make clear the characteristics unique to the SR stimulated process and the develop an essentially new process technology. In situ observation of SR stimulated Si gas source molecular beam epitaxy by infrared reflection absorption spectroscopy and SR irradiation effects on the dimenthylalumium hydride condensed layer by x-ray photoelectron spectroscopy suggest the potential important of the site specific chemical reaction in the condensed system induced by the core electron excitations. A new process technique, selective core electron excitation process using a monochromatized SR beam, is proposed.

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