Abstract

This paper reports on the mechanical response of long postbuckled membranes to differential pressure. In the absence of pressure, membranes with Poisson's ratio /spl nu/=0.25 and prestrain /spl epsiv//sub 0/ more compressive than the critical value -17.3 t/sup 2//a/sup 2/, with the membrane thickness t and width a, show a meander-shaped postbuckling profile. With increasing pressure load, the structures undergo a second-order transition to a ripple-shaped profile at a critical pressure p/sub cr1/(/spl epsiv//sub 0/), and to a ripple-free profile at a higher critical pressure p/sub cr2/(/spl epsiv//sub 0/). At each transition, the structures gain additional symmetries. These phenomena were experimentally studied on micromachined PECVD silicon nitride thin film membranes. A variational calculus approach enabled p/sub cr1/(/spl epsiv//sub 0/), p/sub cr2/(/spl epsiv//sub 0/), /spl epsiv//sub 0,cr2/, and the symmetry contributions to the membrane profiles to be computed. Based on the numerical results, the prestrain and elastic modulus of a PECVD silicon nitride thin film were extracted as /spl epsiv//sub 0/=-1.78/spl times/10/sup -3/ and E=160 GPa, respectively.

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