Sustainable manufacturing process for wafer-scale uniform semiconductor nanostructures

Abstract

In this paper, we report the direct chemisorption-assisted nanotransfer method based on the melting point lowering effect. This transfer method provides the efficient transfer printing of metal template layers onto 6-in wafer scale with excellent uniformity without using chemical adhesive layers. We further demonstrate the fabrication of silicon nanowire photodetectors with high aspect ratio by metal assisted chemical etching. Our results provide an unprecedented nanofabrication approach for next-generation applications such as energy harvesting, optoelectronics, and photonic devices.