Abstract
We report a successful experimental realization of a 2×2 suspended silica splitter integrated on a silicon substrate. The silica splitter was photo-lithographically patterned, etched, and reflowed to form the suspended and rounded silica waveguide channels. The silica splitter showed a flat splitting ratio and excess loss over a wide wavelength range from 1520 to 1630 nm with a low crosstalk. Additionally, as a result of the very low nonlinear coefficients of silica, the splitting ratio is independent of input power.
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