Abstract
We report a successful experimental realization of a 2×2 suspended silica splitter integrated on a silicon substrate. The silica splitter was photo-lithographically patterned, etched, and reflowed to form the suspended and rounded silica waveguide channels. The silica splitter showed a flat splitting ratio and excess loss over a wide wavelength range from 1520 to 1630 nm with a low crosstalk. Additionally, as a result of the very low nonlinear coefficients of silica, the splitting ratio is independent of input power.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
