Surfactant Sputtering: Theory of a new method of surface nanostructuring by ion beams

Abstract

We present a new Monte Carlo model and a new continuum theory of surface pattern formation due to “surfactant sputtering”, i.e. erosion by ion beam sputtering including a submonolayer coverage of additional, co-sputtered surfactant atoms. This setup, which has been realized in recent experiments in a controlled way leads to a number of interesting possibilities to modify pattern forming processing conditions. We will present three simple scenarios, which illustrate some potential applications of the method. In all three cases, simple Bradley–Harper type ripples appear in the absence of surfactant, whereas new, interesting structures emerge during surfactant sputtering.