Surface structuring of diamond-like carbon films by colloidal lithography with silica sub-micron particles

Abstract

By combining colloidal lithography and pulsed-DC plasma deposition of diamond-like amorphous carbon films, we have fabricated sub-microstructures that modulate the surface properties of this material. A self-assembled monolayer of silica sub-micron spheres was deposited on monocrystalline silicon, which was patterned either by thermal annealing of the particles or by hole-mask lithography via ion beam etching with argon. The samples showed hemispherical close-packed topographies and micro-pillar networks. The coefficient of friction, measured with a nanotribometer, and the wettability were controlled through this special surface patterning. These structures are suitable for applications requiring protective coatings with large area showing hydrophobic properties.