Surface states and conductivity of silicon nano-wires

Abstract

The transport characteristics of low dimensional semiconductors like silicon nano-wires (SiNWs) rarely conform to expectations from geometry and dopant density, exhibiting significant variations as a function of different surface terminations/conditions. The association of these mechanisms with surface states and their exact influence on practical SiNW devices still remains largely unclear. Herein, we report on the influence of surface state charge distributions on SiNW transport characteristics. For this study, p-type SiNW devices with widths of 50, 100, and 2000 nm are fabricated from 25, 50, and 200 nm-thick SOI wafers. A ∼five order difference in effective carrier concentration was observed in the initial SiNWs characteristics, when comparing SiNWs fabricated with and without a thermal oxide. The removal of the surface oxide by a hydrogen fluoride (HF) treatment results in a SiNW conductance drop up to ∼six orders of magnitude. This effect is from a surface depletion of holes in the SiNW induced by positive surface charges deposited as a result of the HF treatment. However, it is observed that this charge density is transient and is dissipated with the re-growth of an oxide layer. In summary, the SiNW conductance is shown to vary by several orders of magnitude, while comparing its characteristics for the three most studied surface conditions: with a native oxide, thermal oxide and HF induced H-terminations. These results emphasize the necessity to interpret the transport characteristics of SiNWs with respect to its surface condition, during future investigations pertaining to the physical properties of SiNWs, like its piezo-resistance. As a sequel, prospects for efficiently sensing an elementary reduction/oxidation chemical process by monitoring the variation of SiNW surface potential, or in practice the SiNW conductance, is demonstrated.