Abstract
Laser-induced desorption of NO from Si(111) has been investigated using state-specific detection techniques. Characterization of the internal-state population distributions with desorption-laser wavelengths in the range 1907--335 nm indicate that, at low initial NO coverages, desorption is driven by a common, nonthermal mechanism. The wavelength dependence of the yield and the effects of coadsorbates on the yield establish that photogenerated holes in a Si intrinsic surface state mediate the laser-adsorbate interaction.
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