Abstract
In this study, the researchers demonstrated an ultraprecise polishing method that achieved an improved polycrystalline diamond (PCD) surface. This novel polishing technique uses hydroxyl radicals generated on an iron plate in a hydrogen peroxide (H2O2) solution. To demonstrate the feasibility of obtaining an ultrasmooth PCD surface, we conducted a polishing experiment using an iron plate in an H2O2 solution; the rotating speed of the polishing table/sample holder and the contact load were controlled. After polishing, we cleaned the PCD samples using two different methods and evaluated the surface morphology and chemical components using scanning white light interference microscopy, atomic force microscopy, and an electron-probe micro analyzer. The results showed that atomic-level smoothing of the topmost grain diamond (which constitutes the PCD substrate) could be realized using our proposed method. Moreover, cleaning with a mixed acid (H2SO4/H2O2) solution was more effective in removing residual contaminates than ultrasonic cleaning in acetone.
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