Abstract
The self-diffusion of iridium was studied by means of field electron mi- croscopy. The measurements, based on the well-known process of surface build-up, were carried out under the UHV conditions within the temperature range of 790-935 K. The activation energy for the diffusion was determined to be equal to 2.10f 0.10 eV/atom (48.4f 2.3 kcal/mol). This value is com- pared with activation energies for self-diffusion on other metal surfaces, as well as with those for self-diffusion of single iridium atoms and clusters on iridium, known from the field ion microscopy measurements.
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