Abstract

Computer-controlled dual-rotor polishing, as the final step to correct the optical part surfaces, plays an important role in improving the quality and service life of the surfaces. However, in previous study, the material removal model of dual-rotor polishing was fixed-point polishing model, which could not continuously polish the workpiece. Herein, a novel material removal model of dual-rotor polishing is proposed according to the removal profile orthogonal to the tool path. Firstly, the material removal function per unit time is developed, which is further converted into the material removal function per unit length of the tool path. Secondly, for obtaining the removal profile of dual-rotor polishing, the above function is integrated along the tool path in the polishing area. Then, to verify the effectiveness of the material removal model, the polished profile is studied experimentally and the effects of parameters, such as eccentricity, speed ratio, and main motion feed rate, on material removal of dual-rotor polishing are theoretically analyzed. It is demonstrated that the experimental material removal profiles are in good agreement with the theoretical results; besides, the stable and efficient polishing process can be obtained by optimizing parameters, which have different effects on the material removal depth. This work is of great significance for correcting the optical surface.

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