Surface Quantum Wells in Hydrogen Implanted ZnO

Abstract

Low energy hydrogen ion implantation in ZnO creates an accumulation layer near the surface, giving rise to a quantum well. The corresponding self-consistent Hartree problem is solved by taking into account the donor distribution resulting from the implantation process. The values of the surface potential as a function of repelled away electron concentration are derived. The resulting data are compared with experimental values obtained from space-charge capacitance measurements. A comparative study between the semi-classical and self-consistent quantum treatments is presented.