Surface Properties of the Ta and Ag Dual-Ion-Implanted Ti6Al4V Alloy

Abstract

First, Ti6Al4V alloy samples were modified by tantalum ion implantation at a dose of 1.5×1017ions/cm2, and then silver ion at a dose of 1×1017ions/cm2. Glancing angle X-ray diffraction analysis was used to characterize the phase composition of un-implanted Ti6Al4V alloy and Ta+Ag dual-ion-implanted Ti6Al4V alloy samples. X-ray photoelectron spectroscopy analysis was used to investigate the chemical states of the elements on the Ta+Ag dual-ion-implanted Ti6Al4V alloy sample’s surface. The results show that small amounts of Ta and Ag were present in their elementary forms, along with TiO2, Ta2O5, and TaOx.