Abstract
Surface plasmon lithography is potentially an alternative technique for high resolution patterning. However, implementation involves high cost and challenging fabrication steps. Here, we report nano-patterning assisted by surface plasmons with a perfectly contacted mask using colloidal lithography. A nano-scaled aluminum mask was fabricated using closed packed polystyrene spheres with a simple, fast, and low-cost method, and the loss of surface plasmon waves was reduced by the perfect contact between the mask and the photoresist. A photoresist pattern of two-dimensional hexagonal annular ring arrays was produced by illuminating light of 436 nm wavelength, and the width of the obtained annular ring was approximately λ/6. The simulation results showed that the proposed structure had a sufficiently high contrast value for lithography, and the fabrication patterns and the simulation results presented good agreement.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
