Surface plasmon polaritons maskless lithography of metal–dielectric multilayers with tunable resolution

Abstract

We report the design of surface plasmon polaritons maskless lithography based on metal–dielectric multilayers. The interference pattern is generated by the interference of the counter-propagating bulk plasmon polariton (BPP) modes, which are excited by the attenuated total reflection method. The resolution of the interference fringes can be tuned with the incident angles, because different BPP modes are excited in the metal–dielectric multilayers. The feature size as small as 34nm (about λ/13) can be realized under the 436nm TM-polarized illumination, which is suitable for deep-subwavelength lithography. The exposure depth decreases with increasing the resonant angle. Electromagnetic simulations by a finite difference time-domain method on the two-dimensional and three-dimensional examples have been performed to validate the designs.