Abstract

We report surface pre-treatment technique for high quality graphene layer formation on SiC surface. It has been demonstrated that silicon passivation of SiC surface using silane flow and subsequent sacrificial oxidation can significantly improve surface condition of the graphene layer on SiC with much fewer carbon dumps and wrinkles, reduced electrical resistance, smoother surface roughness of ~ 2.7 Aå and larger domain size of ~380 Aå. Our results suggest that surface treatment before graphitization is the key to synthesize high quality epitaxial graphene layer.

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