Surface OH group governing adsorption properties of metal oxide films

Abstract

Time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and contact angle measurements were applied to investigate the relationship between the adsorption of organic substances from the atmosphere and the surface OH group density of metal oxide films deposited onto glass by r.f. reactive magnetron sputtering. The amount of adsorbed carbon substances on the films is dependent on the surface OH group density of the films. This fact indicates that the surface OH group density is a major factor governing the adsorption of organic substances from the atmosphere on the films. It is also found that the surface OH group density is dependent on the film materials. This dependence is explained with respect to the electronegativity of the metal element directly bound to oxygen atoms.