Abstract
Manipulation of surface nanostructure is reported by a sequential multi stage novel combination of all atmospheric pressure based processing. Firstly a thermal chemical vapour deposition (CVD) process is used to deposit a thin zinc oxide film. A flame assisted CVD process is then used to produce the patterning layer. Subsequently an atmospheric pressure dielectric barrier discharge plasma is used to etch the surface to further nanostructure it. We report that this approach can be used to generate a low surface energy organic surface treatment using atmospheric pressure plasma enhanced chemical vapour deposition. The films were characterised by means of atomic force microscopy, transmission spectroscopy, scanning electron microscopy and contact angle.
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