Abstract
We have grown ErP on Ga 0.52In 0.48P (001) lattice-matched to GaAs and on InP (001) by low-pressure organometallic vapor phase epitaxy and investigated the surface morphology of ErP layers. Lattice-mismatch in ErP/Ga 0.52In 0.48P/GaAs heterostructures (Δ a / a = − 0.8%) is much less than that of ErP/InP heterostructures (− 4.5%). Extended X-ray absorption fine structure measurement revealed that Er exists in the form of ErP rock-salt structure in both samples. The estimated growth rate of ErP on Ga 0.52In 0.48P is 1.8 ML/h. Our results demonstrate that ErP on Ga 0.52In 0.48P has smaller surface roughness than ErP on InP. Moreover, an ErP layer exists underneath the surface about 2 ML and the surface roughness does not depend on the ErP thickness in the range of our experiments (2.2–13.7 ML).
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