Abstract

CdO thin films doped with different concentrations of chromium were deposited on mica substrates by DC reactive magnetron sputtering method. The effect of Cr concentration (1% to 5%) on structural, electrical and optical properties of CdO films was investigated. The structural studies reveal that the films are polycrystalline with preferred orientation along (1 1 1) plane. From the FESEM micrographs, it was clearly seen that all the films have smooth and homogeneous surface morphology. The optical transmittance of 72% and minimum resistivity of 5.36 x 10-4Ω.cm is obtained for 4% Cr doped CdO thin films. The optical band gap of Cr doped CdO thin films increases from 2.72 to 2.81 eV with the increase of Cr concentration due to Burstein-Moss effect. The optical constants such as absorption coefficient (α), extinction coefficient (k) and refractive index (n) were determined from the optical transmission data.

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