Abstract
Ultrathin Al films with different thicknesses were deposited on glass substrates by DC magnetron sputtering. The effects of film thickness on morphology and optical properties of the films were investigated in detail. When film thickness increases from 7.0 to 84.0 nm, the average grain size and surface roughness enlarges from 27.6 to 94.2 nm and from 0.25 to 1.87 nm, respectively. Below critical thickness of 28.0 nm, which is the thickness that Al films form continuous film, the optical properties vary significantly with thickness increasing and then tend to be stable. In the absorptance spectra, all films exhibit distinct broad peaks which can be attributed to the absorption due to the interband transition. The possible reasons for the shift in the peak position are due to the quantum size effects and internal stress in the ultrathin Al films.
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