Abstract
This work aims to study the surface morphology of solar cells before and after reactive ion etching (RIE) at two different pressures. Two types of solar cell based on GaAs and polycrystalline Si were processed and compared. Energy Dispersive X-ray spectroscopy (EDS) was used for the composition analysis of the samples. Raman spectroscopy showed a structural fingerprint of materials before and after processing. Atomic Force Microscope (AFM) demonstrated dimensional topography with high resolution. Optical spectrometer detected changing of reflectance the samples. Experimentally, it has been confirmed that GaAs solar cells have a very high endurance to ion bombardment in comparison to Si cells.
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