Abstract

Vertically aligned graphene nanosheets (VAGNS) are grown by plasma enhanced chemical vapor deposition (PECVD) using electron cyclotron resonance (ECR) plasma system for application as an anode material in lithium ion battery (LIB). Microwave assisted etching, in presence and absence of substrate bias, is carried out on as grown VAGNS films to modify the morphology of the film. Scanning electron microscopy (SEM) is used for characterizing the surface features of the VAGNS films. The VAGNS sample which is microwave plasma treated (power 400W) with substrate bias of 100V, showed an initial charging specific capacity of 223μAh·cm−2·μm−1, while as deposited VAGNS showed specific capacity of 124.4μAh·cm−2·μm−1. After 5cycles, while the former showed a specific capacity of 68.1μAh·cm−2·μm−1 (760.7mAhg−1), while the later showed a specific capacity of 43.9μAh·cm−2·μm−1(458.7mAh·g−1). During discharge initially while surface modified VAGNS showed a capacity of 100.1μAh·cm−2·μm−1, the as deposited VAGNS showed a capacity of 38.2μAh·cm−2·μm−1. The specific capacity after five cycles, during discharge for modified VAGNS is 68μAh·cm−2·μm−1 (725.9mAhg−1), and for as deposited VAGNS it is 34μAh·cm−2·μm−1(380.6mAh·g−1). The specific capacity remains fairly constant after this initial capacity loss up to 50cycles. The results indicate that surface modification of VAGNS improves the performance of the material as anode for lithium ion battery.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.