Surface modification of silicon and PTFE by laser surface treatment: improvement of wettability

Abstract

Laser surface treatment was used to modify the surface of silicon and PTFE (polytetrafluoroethylene). This method is in order to improve its wettability and adhesion characteristics. Using a 4th harmonic Nd:YAG pulse laser (λ = 266 nm, pulse), we determined the wettability and the adhesion characteristics of silicon and PTFE surfaces developed by the laser irradiation. Particularly, surface treatment of PTFE was only effective when the irradiated interface was in contact with the triethylamine photoreagent. We investigated laser surface treatment of materials by the surface energy modification. By using the sessile drop technique with distilled water, we determined that the wettability of silicon and PTFE after the irradiation showed a decrease in the contact angle and a change in the surface chemical composition. In case of the laser-treated materials surface, laser direct writing of copper lines was achieved through pyrolytic decomposition of copper formate films by using a focused argon ion laser beam (λ = 514.5 nm, cw) on silicon and PTFE substrates. The deposited patterns and the surface chemical compositions were measured by using energy dispersive X-ray, scanning electron microscopy, X-ray photoelectron spectroscopy, and surface profiler to examine cross section of the deposited copper lines.