Abstract
Nanoscale surface modification of silicate glasses was examined by applying nanoimprint technique using a nanostriped NiO thin film mold. The mold had the pattern composed of regularly arranged straight nanogrooves, which was formed by high-temperature annealing of the Li-doped NiO epitaxial thin film deposited on the atomically stepped sapphire (α-Al2O3 single crystal) substrate. The glass imprint was proceeded through the simple steps of heating (∼600°C), pressing (∼1kPa) and then cooling in air. The nanoimprinted glass surface transferred reversely from the mold exhibited the multi nanowire array having an interval of ∼80nm, wire width of ∼70nm, and wire height of ∼20nm.
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