Surface modification in the optical near field

Abstract

The potential use of optical near-field techniques for lithographic purposes is reviewed. After a brief introduction of the experimental schemes used in scanning near-field optical microscopy (SNOM), we discuss near-field exposure of conventional photo resists, local surface modifications in ultra-thin organic layers, and near-field magneto-optic recording. The state of the art in terms of lateral resolution and speed is discussed in view of possible implementation in technological processes. A brief sketch of possible future developments is given.