Abstract
The influence of bias voltage on surface microstructure of TiN films deposited on Ti substrate by multi-arc ion plating was systematically investigated. The TiN films were characterized using X-ray diffraction, scanning electron microscopy and atomic force microscopy. The corrosion resistance was tested by potentiodynamic polarization and electrochemical impedance spectroscopy at 70–80 °C in the simulated PEMFC cathode environment. The results show that the surface microstructure of TiN film depends strongly on the bias voltages. At the bias voltage of −100 V, TiN film shows the optimum surface microstructure with the lowest surface roughness Rz of 0.039 μm tested by AFM and relatively high compactness. The optimized TiN film exhibits excellent corrosion resistance with corrosion current density of 0.87 μA/cm2 in a 0.5 M H2SO4 + 2 ppm HF solution at 80 °C with air and a low interfacial contact resistance (ICR) value of 3.0 mΩ cm2 at a compaction force of 140 N/cm2. These results support TiN as a promising coating material for Ti bipolar plates.
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