Abstract
The effects of argon ion sputtering and vacuum annealing on hydrogen permeation through niobium are studied and a new permeation model is presented. Sputtering is ∼10 times more effective in enhancing the permeation rate than vacuum annealing. The pressure dependence of permeation rate exhibits the mixed contribution of surface process and diffusion in bulk to the kinetics. The transient permeation curve reveals that the surface process is dominant of the two processes.
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