Abstract
This paper presents the optimum chemical template to microfabricate reproducibly the metal oxide film, i.e., tin oxide (SnO x ), on the substrate from aqueous solution of tin chloride utilizing “monolayer-template-patterning (MTP)” technique. Silicon substrates covered with self-assembled monolayers (SAMs) were photolithographically micropatterned to prepare the chemical templates of SAMs on SiO x /Si substrate. Three types of SAM-covered substrates, that is, CH 3-, CHO-, and COOH-terminated substrates, were investigated to find the most appropriate chemical template for the MTP of SnO x . On the CH 3-terminated SAM template, well-defined microstructures of SnO x were observed, while neither of others, i.e., CHO-SAM and COOH-SAM templates, has reproducibly resulted in micropatterned SnO x .
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
