Abstract
We have measured the depth profile of a Cu-48.2at%Zn alloy by means of Auger Electron Spectroscopy combined with Ar + ion bombardment. We have also measured the steady state surface concentration for different ion energies, and the transient variation of surface concentration when ion energies were changed from 0.5 to 5 keV and vice versa. We found that the effect of altered layer thickness and the Auger electron escape depth can produce an incorrect measurement of the preferential sputtering energy dependence. We also found that the presence of a strong preferential sputtering can shadow AES measurement of concentration variations along a depth profile.
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