Abstract
Laser photoablation and surface-photodissociation are studied by detecting of photoftagments of molecules adsorbed on substrates. Pulsed excimer-laser irradiation ablates Si atoms from an Si wafer. The mechanism of this ablation was examined by laser-induced fluorescence analysis of Si atoms. The spatially and time-resolved detection of metal atoms ablated in the laser photo-CVD process of organometallic compounds was performed. Laser irradiation of a multilayer of chlorine and methyl chloride on an Si wafer leads to both photodissociation and formation of photoetching products. The products were detected with a photofragment mass spectrometer. The dynamics of photoablation and surface photodissociation are deduced from translational energy distributions of these photofragments photoablated from the substrate surface.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
